JPH0355815B2 - - Google Patents

Info

Publication number
JPH0355815B2
JPH0355815B2 JP60185060A JP18506085A JPH0355815B2 JP H0355815 B2 JPH0355815 B2 JP H0355815B2 JP 60185060 A JP60185060 A JP 60185060A JP 18506085 A JP18506085 A JP 18506085A JP H0355815 B2 JPH0355815 B2 JP H0355815B2
Authority
JP
Japan
Prior art keywords
pattern
light
divided
original mask
transfer
Prior art date
Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
Expired - Lifetime
Application number
JP60185060A
Other languages
English (en)
Japanese (ja)
Other versions
JPS6244740A (ja
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Application filed filed Critical
Priority to JP60185060A priority Critical patent/JPS6244740A/ja
Publication of JPS6244740A publication Critical patent/JPS6244740A/ja
Publication of JPH0355815B2 publication Critical patent/JPH0355815B2/ja
Granted legal-status Critical Current

Links

Classifications

    • G—PHYSICS
    • G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
    • G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
    • G03F1/00—Originals for photomechanical production of textured or patterned surfaces, e.g., masks, photo-masks, reticles; Mask blanks or pellicles therefor; Containers specially adapted therefor; Preparation thereof

Landscapes

  • Physics & Mathematics (AREA)
  • General Physics & Mathematics (AREA)
  • Preparing Plates And Mask In Photomechanical Process (AREA)
  • Exposure And Positioning Against Photoresist Photosensitive Materials (AREA)
  • Exposure Of Semiconductors, Excluding Electron Or Ion Beam Exposure (AREA)
JP60185060A 1985-08-23 1985-08-23 パタ−ン形成方法 Granted JPS6244740A (ja)

Priority Applications (1)

Application Number Priority Date Filing Date Title
JP60185060A JPS6244740A (ja) 1985-08-23 1985-08-23 パタ−ン形成方法

Applications Claiming Priority (1)

Application Number Priority Date Filing Date Title
JP60185060A JPS6244740A (ja) 1985-08-23 1985-08-23 パタ−ン形成方法

Publications (2)

Publication Number Publication Date
JPS6244740A JPS6244740A (ja) 1987-02-26
JPH0355815B2 true JPH0355815B2 (en]) 1991-08-26

Family

ID=16164103

Family Applications (1)

Application Number Title Priority Date Filing Date
JP60185060A Granted JPS6244740A (ja) 1985-08-23 1985-08-23 パタ−ン形成方法

Country Status (1)

Country Link
JP (1) JPS6244740A (en])

Families Citing this family (3)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JPH10104814A (ja) * 1996-09-27 1998-04-24 Fujitsu Ltd マスクの製造方法
JPH1167627A (ja) * 1997-08-12 1999-03-09 Seiko Epson Corp 露光方法
JP2006078825A (ja) 2004-09-10 2006-03-23 Shin Etsu Chem Co Ltd フォトマスクブランクおよびフォトマスクならびにこれらの製造方法

Family Cites Families (2)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JPS53128278A (en) * 1977-04-14 1978-11-09 Oki Electric Ind Co Ltd Production of lsi mask
JPS5463680A (en) * 1977-10-29 1979-05-22 Oki Electric Ind Co Ltd Production of mask for integrated circuit

Also Published As

Publication number Publication date
JPS6244740A (ja) 1987-02-26

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Legal Events

Date Code Title Description
EXPY Cancellation because of completion of term